CPC-600
Centrifugal Cleaner
CPC-600 :
High Cleanliness system;
High pressure -----Two Fluid-----Centrifugal dry;
-----Wafer, CMOS, Holder, Holder+IR,
LCD, VCM , CCD: Particle,Dust...
High Cleanliness system;
High pressure -----Two Fluid-----Centrifugal dry;
-----Wafer, CMOS, Holder, Holder+IR,
LCD, VCM , CCD: Particle,Dust...
Features
Wafer
Holder
Filter
CMOS(COB&CSP)
LCD
CCD
Specification
Technical Parameters | |
---|---|
Water Plate | Φ 600mm |
Max Size | 200mm(L)×140mm(W) |
Cleaning Type | High Pressure+two fluid cleaning |
Dry model | High speed centrifugal rotary |
Rotary speed | 0--2840 r/min |
Pressure release | 1.5—13.8kg |
Filter precision | 0.1UM |
Air filter precision | 0.01UM |
Particle clean ability | ≧1um 98% |
Equipment material | 316 SUS |
Pressure | >2.0Kgf |
Water fluid range | <10.8L/min |
DI water requirement | >16MΩ |
CDR requirement | 0.45—0.7mpa |
CDR cleanliness requirement | 0.01um/99.5% above, oil less than<0.1ppm |
CDR consumption | Two fluid cleaning:<100L/min |
Air outlet capacity | 5.0m³/min |
Control Model | PLC+touch screen |
Power supply | 380V 10A 50HZ |
Weight | 480kg |
Size | 870mm(L)X1000mm(W)X1750mm(H) |