AST-D300
Single Wafer Developer
Automatic single wafer developer, suitable to 8”/12”developer coating and developing process, special design to ensure spray and coating evenly and quickly.
Features
- Process uniformity is available to adjust with recipe;
- Better yield than wet bench type.
- Single wafer conditions can be controllable and traceability;
- Process parameter is easy to adjust.
- Special design of spray device, ensure coating evenly.
- Small footprint and high ROI
- Suitable for wafer dry in/ dry out process
- Better safety than bench type.
Application
Design for different type bumping, RDL and Package Developing, 8/12 inch wafer developing liquid spray, puddle, spin and PDB process.
