AST-E300
Single Wafer Spin Etcher
- Single wafer set etching spin processor，using for UBM、RDL 、BGBM and different metal etching, cleaning and resistance remove。
- Different chamber design, good chemical recovery rate, and different chemical process in one chamber.
- Precision control of spin arm and spray device to control the chemical spray evenly.
Features
- Process uniformity is available to adjust with recipe;
- Single wafer conditions can be controllable and traceability;
- Process parameter is easy to adjust.
- Control the chemical usage and ensure each chips have same process conditions
- Better safety than bench type.
- Cleanliness control better than batch method;
- Small footprint
- Suitable for wafer dry in/ dry out process
Application
8&12 inch wafer etching process, esp. for UBM、RDL, BGBM and metal
